SkyWater has received a Multicolumn E-Beam Lithography (MEBL) system for volume production from Multibeam Corp.
The Multibeam (MB) platform offers a high-throughput direct write patterning system that is orders of magnitude faster and more productive than conventional e-beam tools. The MB system will be available to SkyWater customers for early concept prototyping and rapid production.
“From the outset of our engagement with SkyWater they supported our mission to re-innovate EBL for high-volume production and provided critical user perspectives that helped us accelerate our development program and commercialise a world-class maskless lithography system,” says Multibeam CEO David Lam.
SkyWater will enable access to the tool for initial customer designs in 4Q24.
